Parallel- and serial-contact electrochemical metallization of monolayer nanopatterns: A versatile synthetic tool en route to bottom-up assembly of electric nanocircuits

• Jonathan Berson,
• Assaf Zeira,
• Rivka Maoz and
• Jacob Sagiv

Beilstein J. Nanotechnol. 2012, 3, 134–143, doi:10.3762/bjnano.3.14

• –solution interface by ion migration to the electrode rather than by electron transfer to hydrated ions in solution. Keywords: AFM (SFM); bipolar electrochemistry; electrochemical metal deposition; monolayer patterning; nanolithography; self-assembled organosilane monolayers; Introduction The quest for a

• ][20][21][22][23][24][25][26][27][28]. To this end, a monolayer-patterning methodology, referred to as constructive lithography (CL), has been advanced, which allows nondestructive local electrooxidation of the top –CH3 groups of a self-assembled OTS/Si monolayer (highly ordered monolayer assembled on

• this kind. For the same reason, the corresponding contact-mode topographic images yield false height contrast, dependent on the direction of tip motion relative to the sample (see Supporting Information File 1, Figures S2 and S3). This is a characteristic feature of monolayer patterning by constructive